November 10, 2010
Xu Ma
Gonzalo R. Arce
Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (reTs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of reTs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPc), phase shifting mask (PSM), and off-axis illumination (OaI) reT tools that use model-based mathematical optimization approaches.The accompanying MaTLaB® software files for all the reT methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. Tailored for both entry level and experienced readers, computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor Ic fabrication, optical lithography, and reTs. Computational Lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such the book is also directed to researchers and practitioners in these fields.
Publisher: Wiley
Published: March 2010
ISBN: 978-0-470-59697-5 (Hardcover)