ELEG 450/650 Spring
2002 Schedule (rev. 6 May 2002) J. Kolodzey
Week Date Lecture Laboratory Assignment
1 2/4 Handouts L-Edit
Practice Read
Safety Manual
Course overview Read
Lab Guidelines.
Lab Safety Read
Jaeger pp. 1-14
2 2/11 Lab Safety L-Edit
Practice nMOS
Transistor Layout
MOSFET operation Read
Jaeger pp. 17-40
L-Edit overview Read
Uyemura pp. 1.1-1.22
Process overview Read
H&H pp. 514-530
3 2/18 Inverters Field
oxidation Jaeger
pp. 43- 64. Choose circuit
Photolithography project. Read H&H, pp. 542-552.
Digital Circuits
Metal Gate
Process
4 2/25 Device sizing. p-Diffusion
lithography Jaeger pp. 67-
87.
Layout criteria p-Diffusion window
etch H&H pp.
530-535. Circuit
Design rules.
logic for pMOS S/D;
p-tub project description
due.
design, device
layout
5 3/4 Inverters Boron
diffusion Circuit
schematic diagram due.
Digital Circuits Test
discrete circuit version.
Noise margins Jaeger
pp. 87 - 102
6 3/11 Mask design 2nd
Field oxidation Circuit
mask set due.
Process testing Read
Jaeger Chapter 5.
Threshold
control MOS
layout design rules Quiz Wednesday
Etching
7 3/18 Circuit layout n
diffusion lithography Review
Jaeger Chapter 2
n-Diffusion
window etch Build discrete
version of circuit
8 3/25 Atomic Diffusion Phosphorus
diffusion H&H pp.
536-541
Read
Jaeger pp. 201- 228; 277 - 279.
Test
discrete version of circuit
9 4/8 Diffusion Gate
oxide lithography Jaeger pp. 183-195, 235-243
Gate
oxide etch Circuit
project mask set due
Gate
oxidation H&H
pp. 542-552
10 4/15 Oxidation Contact cut
lithography Revised mask
due.
Contact
cut etch Read Jaeger Chap 3; pp. 151-173.
Hour
Quiz April 17
11 4/22 MEMS
design metal
liftoff lithography Read
Jaeger Chap 11; pp. 194 - 198
Final
corrected mask due
12 4/29 SUPREM
simulations metal evap. and
liftoff Read Jaeger
Chap. 6
FET Device
testing Circuit Testing
I H&H pp.
535-536, 541-542
13 5/6 Circuit
testing Emulsion
mask making Read Jaeger
Chap. 9
Circuit delay
times Demo circuit to
TA
14 5/13 Circuit power dissip. Ferrox
mask making/demo Comprehensive
Final Report
Vacuum systems. Prepare final reports due Thursday, 23 May, 4:30
pm
Final
Exam: 5/22, 10:30 - 12:30